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Suitable for electronic semiconductor, large scale integrated circuit, MAMS, monocrystalline silicon polycrystalline silicon and silicon epitaxy, LED, TFT, gallium nitride, silicon carbide, scientific research and development, experimental analysis, etc.

● Suitable for nitrogen, hydrogen, oxygen, argon, helium and ammonia. The raw gas is not less than 99.999%
● Deep removal of impurities O ₂ , H ₂ O, CO, CO ₂ , H ₂ , N ₂ , CH ₂ and NMHC to 1ppB / 10ppB
● Double tower alternate adsorption regeneration, single tower catalysis, terminal Getter adsorption, automatic continuous operation
● EP class 316L polished stainless steel pipe fittings
● With 0.003 m filter, removal rate can reach 99.999999% /99.99999%
● Siemens PLC can be connected to DCS system
● The security alarm function is perfect
● Remote cloud service is available
● Production and assembly in a super clean environment
● Gas capacity 10-20000nm ³ /h